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Nimeke: Soft Graphoepitaxy for Large Area Directed Self-Assembly of Polystyrene-block-Poly(dimethylsiloxane) Block Copolymer on Nanopatterned POSS Substrates Fabricated by Nanoimprint Lithography
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Advanced Functional Materials [1616-301X] Borah, Dipu v:2015 vsk/osa:25 iss:22 s:3425 -3432

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